Deposition of thin layers by laser ablation technique

The Group is focused on a long-term basis on the deposition of thin layers by laser ablation. Excimer ArF and Infrared TEA CO2 lasers are used for this purpose. The deposition in high vacuum (10^-3 Pa and lower) is used for the preparation of thin oxide, silicide, or metal layers by single ablation of solid targets. Due to high cooling rates, the prepared layers are usually amorphous. Heating at increased temperatures leads to crystalline materials with modified properties optimized for photocatalytic and sensor applications.